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ALS Beamlines and Contacts
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| Beamline | Source* | Areas of Research/Techniques (linked to beamline Web site, where available) |
Energy Range | Beamline Scientist(s) |
|---|---|---|---|---|
| 1.4.3 | Bend | Infrared spectromicroscopy | 0.05-1.2 eV | M. Martin (510) 495-2231 |
| 1.4.4 | Bend | Infrared spectromicroscopy | 0.05-1.5 eV | |
| 2.1 | Bend | National Center for X-Ray Tomography (NCXT) |
200 eV-7 keV |
M. Le Gros
(510) 486-6892 |
| 3.1 | Bend | Diagnostic beamline | 1-2 keV |
F. Sannibale
(510) 486-5924 |
| 3.2.1 | Bend | Commercial deep-etch x-ray lithography (LIGA) | 3-12 keV | G. Reiff (510) 495-2032 |
| 4.0.2 | EPU5 | Magnetic and biochemical spectroscopy | 80-1900 eV | E. Arenholz
(510) 495-2041 |
| 4.0.3 | EPU9 | High-resolution spectroscopy of complex materials (MERLIN) Operational: 2010 |
10-150 eV | Yi-De Chuang (510) 495-2049 |
| 4.2.2 | Superbend | Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography | 5-17 keV | Jay Nix Ed Westbrook Michael McCormick (510) 486-6652 |
| 5.0.1 | W11 | Monochromatic macromolecular crystallography and Se Single Wavelength Anomalous Diffraction (Se-SAD) | 12.4 keV |
S. Morton P. Zwart (510) 495-2051 (510) 495-2052 (510) 495-2054 |
| 5.0.2 | W11 | Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography | 4-16 keV | |
| 5.0.3 | W11 | Monochromatic macromolecular crystallography | 12.4 keV | |
| 5.3.1 | Bend | Instrumentation development | 1.8-12 keV | R. Celestre (510) 495-2053 |
| 5.3.2 | Bend | Polymer scanning transmission x-ray microscopy | 200-650 eV | D. Kilcoyne (510) 495-2057 |
| 6.0.1 | U3 | Femtosecond phenomena Operational: 2009 |
2-10 keV |
P. Heimann (510) 495-2087 |
| 6.0.2 | U3 | Femtosecond phenomena | 200-1800 eV | |
| 6.1.2 | Bend | High-resolution zone-plate microscopy | 300-1300 eV | P. Fischer (510) 495-2061 |
| 6.3.1 | Bend | Magnetic spectroscopy and materials science | 300-2000 eV | E. Arenholz 510 495-2062 |
| 6.3.2 | Bend | Calibration and standards; EUV optics testing; atomic, molecular, and materials science | 50-1300 eV | E. Gullikson (510) 495-2063 |
| 7.0.1 | U5 | Surface and materials science, spectromicroscopy | 60-1200 eV | J. Guo (510) 495-2070 (510) 495-2079 E. Rotenberg (510) 495-2071 Aaron Bostwick (510) 486-4816 |
| 7.2 | Bend | Diagnostic beamline | Far IR- 17 keV | F. Sannibale
(510) 486-5924 |
| 7.3.1 | Bend | Magnetic microscopy, spectromicroscopy Note: This program has moved to Beamline 11.0.1 |
175-1500 eV | A. Scholl (510) 495-2073 |
| 7.3.3 | Bend | Small- and wide-angle x-ray scattering (SAXS/WAXS) | 10 keV | A. Hexemer (510) 495-2075 (510) 495-2076 |
| 8.0.1 | U5 | Surface and materials science, imaging photoelectron spectroscopy, soft x-ray fluorescence | 65-1400 eV | W. Yang J. Denlinger (510) 495-2080 (510) 495-2089 |
| 8.2.1 | Superbend | Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography | 5-17 keV | C. Ralston S. Morton (510) 495-2081 (510) 495-2082 |
| 8.2.2 | Superbend | Multiple-wavelength anomalous diffraction (MAD) and monochromatic macromolecular crystallography | 5-17 keV | |
| 8.3.1 | Superbend | Multiple-wavelength anomalous diffraction (MAD) and monochromatic protein crystallography | 2.4-18 keV | J. Holton (510) 495-2083 |
| 8.3.2 | Superbend | Tomography | 5-60 keV | A. MacDowell (510) 495-2005 |
| 9.0.1 | U10 | Coherent optics experiments | 200-800 eV | S. Marchesini D. Shapiro (510) 495-2091 |
| 9.0.2 | U10 | Chemical dynamics | 7.5-25 eV | M. Ahmed K. Wilson (510) 495-2092 |
| 9.3.1 | Bend | Atomic, molecular, and materials science Note: This beamline is NOT open to general users. |
2.2-5.5 keV |
Z. Hussain (510) 486-7591 (ALS contact) |
| 9.3.2 | Bend | Chemical and materials science, circular dichroism, spin resolution | 30-1400 eV | Z. Liu (510) 495-2109 |
| 10.0.1 | U10 | Photoemission of highly correlated materials; high-resolution atomic, molecular, and optical physics | 17-340 eV | (HERS) Z. Hussain (510) 486-7591 (AMO) A. Aguilar (510) 495-2102 |
| 10.3.1 | Bend | X-ray fluorescence microprobe | 3-20 keV | S. Cliff
(510) 495-2103 |
| 10.3.2 | Bend | Environmental and materials science, micro x-ray absorption spectroscopy | 2.5-17 keV | M. Marcus (510) 495-2106 |
| 11.0.1 | EPU 5 | Magnetic microscopy, spectromicroscopy (PEEM3) |
100-2000 eV |
A. Scholl (510) 495-2010 |
| 11.0.2 | EPU5 | Molecular environmental science | 95-2000 eV | D. Shuh T. Tyliszczak (510) 495-2077 |
| 11.3.1 | Bend | Small-molecule crystallography | 6-17 keV | S. Teat (510) 495-2117 |
| 11.3.2 | Bend | Inspection of EUV lithography masks | 50-1000 eV |
K. Goldberg
(510) 495-2077 Iacopo Mochi |
| 12.0.1 | U8 | EUV optics testing and interferometry, angle- and spin-resolved photoemission | 24-350 eV | (ARPES) A. Fedorov (510) 495-2121 (EUV/ MET) K. Goldberg P. Naulleau (510) 495-2120 (510) 495-2107 |
| 12.0.2 | U8 | Coherent soft x-ray science | 2001000 eV | S. Roy
(510) 495-2107 |
| 12.2.2 | Superbend | California High-Pressure Science Observatory (CALIPSO) | 6-40 keV | S. Clark (510) 495-2055 |
| 12.3.1 | Superbend | Structurally Integrated Biology for Life Sciences (SIBYLS) | 5.5-17 keV |
G. Hura
M. Hammel S. Classen (510) 495-2134 |
| 12.3.2 | Superbend | X-ray microdiffraction |
6-22 keV |
N. Tamura
(510) 486-4625 Martin Kunz (510) 486-6789 |
| BTF | Linac | Beam Test Facility | 50-MeV electrons | B. Ludewight (510) 495-2021 W. Byrne (510) 495-2009 |
* Bend bend magnet Superbend Superconducting bend magnet EPUx x-cm-period elliptical polarization undulator Ux x-cm-period undulator Wx x-cm-period wigglerTechnical Specifications