Operational

Now

Source characteristics

Bend magnet

Energy range

3–12 keV

Monochromator

None

Endstations

Hutch with automated scanner

Calculated spot size at sample

100 x 10 mm

Samples

Format

3- and 4-in. wafer format; x-ray mask and LIGA substrate

Sample environment

Ambient, air

Scientific applications

Deep-etch x-ray lithography (LIGA)

Local contact

Name: Cheryl Hauck
Phone: (510) 486-7885
Fax: (510) 486-4102
Email: cahauck@lbl.gov

Spokesperson

Name: Dale Boehme
Affiliation: AXSUN Technologies Inc.
Phone: (925) 373-3174, ext. 102
Fax: (925) 373-3178
Email: dboehme@axsun.com

Beamline phone number

(510) 495-2032