Operational

Now

Source characteristics

Bend magnet

Energy range

1–20 keV (Be low-energy cutoff filter)

Monochromator

None

Calculated flux (1.9 GeV, 400 mA)

2.7 x 10¹³ photons/s/0.1%BW

Endstations

Small hutch with wafer scanner

Calculated beam dimensions at sample

109.4 mm x 11.6 mm

Scientific applications

Research and development on deep-etch x-ray lithography such as LIGA (micromachining of high-aspect-ratio microstructures)

Local contact

Name: Cheryl Hauck
Phone: (510) 486-7885
Fax: (510) 486-4102
Email: cahauck@lbl.gov

PRT spokespersons

Name: Craig Henderson
Affiliation: Sandia National Laboratories
Phone: (925) 294-3628
Fax: (925) 294-3870
Email: cchende@sandia.gov

Name: Howard Bender
Affiliation: Sandia National Laboratories
Phone: (925) 294-1438
Fax: (925) 294-3870
Email: habende@sandia.gov

Beamline phone number

(510) 495-2033