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Page last updated January 15, 2003
Inspection of EUV Lithography Masks
Operational
Now
Source characteristics
Bend magnet
Energy range
50–1000 eV
Monochromator
VLS-PGM
Calculated flux (1.9 GeV, 400 mA)
1011 photons/s/0.01%BW at 100 eV
Resolving power (E/DE)
7000
Endstations
Scanning bright field and dark field mask inspection
Spot size at sample
2.5 x 4 µm
Local contact
Name: Moonsuk Yi Phone: (510) 486-4954 Email: msyi@lbl.gov
Spokesperson
Name: Jeffrey Bokor Affiliation: Univ. of California, Berkeley; Center for X-Ray Optics, Berkeley Lab Phone: (510) 642-4134 Fax: (510) 642-2739 Email: jbokor@eecs.berkeley.edu
Beamline phone number
(510) 495-2117
Table of all beamlines