|
Beamline
|
Source*
|
Areas of Research/Techniques
|
Energy Range
|
Operational
|
|
1.4.1
|
Bend
|
Ultraviolet Photoluminescence
|
1.6–6.2 eV
|
Now
|
|
1.4.2
|
Bend
|
Visible and Infrared Fourier Transform Spectroscopy (FTIR)
|
0.002–3 eV
|
Now
|
|
1.4.3
|
Bend
|
Infrared Spectromicroscopy
|
0.05–1 eV
|
Now
|
|
3.1
|
Bend
|
Diagnostic Beamline
|
1–2 keV
|
Now
|
|
3.3.1
|
Bend
|
Commercial Deep-Etch X-Ray Lithography (LIGA)
|
3–12 keV
|
Now
|
|
3.3.2
|
Bend
|
Deep-Etch X-Ray Lithography (LIGA)
|
1–20 keV
|
Now
|
|
4.0.2
|
EPU5
|
Magnetic Spectroscopy
|
52–1900 eV
|
Now
|
|
4.2.2
|
SB
|
Multiple-Wavelength Anomalous Diffraction (MAD) and Monochromatic Protein Crystallography
|
6–18 keV
|
2002
|
|
5.0.1
|
W16
|
Monochromatic Protein Crystallography
|
12.4 keV
|
Now
|
|
5.0.2
|
W16
|
Multiple-Wavelength Anomalous Diffraction (MAD) and Monochromatic Protein Crystallography
|
3.5–14 keV
|
Now
|
|
5.0.3
|
W16
|
Monochromatic Protein Crystallography
|
12.4 keV
|
Now
|
|
5.3.1
|
Bend
|
Femtosecond Phenomena
|
1.8–12 keV
|
Now
|
|
5.3.2
|
Bend
|
Polymer Scanning Transmission X-Ray Microscopy
|
150–650 eV
|
Now
|
|
6.1.2
|
Bend
|
High-Resolution Zone-Plate Microscopy
|
300–900 eV
|
Now
|
|
6.3.1
|
Bend
|
Calibration and Standards, EUV/Soft X-Ray Optics Testing, Solid-State Chemistry
|
500–2000 eV
|
Now
|
|
6.3.2
|
Bend
|
Calibration and Standards; EUV Optics Testing; Atomic, Molecular, and Materials Science
|
50–1300 eV
|
Now
|
|
7.0.1
|
U5
|
Surface and Materials Science, Spectromicroscopy, Spin Resolution, Photon-Polarization Dichroism
|
50–1200 eV
|
Now
|
|
7.3.1.1
|
Bend
|
Magnetic Microscopy, Spectromicroscopy
|
175–1500 eV
|
Now
|
|
7.3.1.2
|
Bend
|
Surface and Materials Science, Micro X-Ray Photoelectron Spectroscopy
|
175–1500 eV
|
Now
|
|
7.3.3
|
Bend
|
X-Ray Microdiffraction
|
6–12 keV
|
Now
|
|
8.0.1
|
U5
|
Surface and Materials Science, Imaging Photoelectron Spectroscopy, Soft X-Ray Fluorescence
|
65–1400 eV
|
Now
|
|
8.2.1
|
SB
|
Multiple-wavelength Anomalous Diffraction (MAD) and Monochromatic Protein Crystallography
|
6–18 keV
|
Now
|
|
8.2.2
|
SB
|
Multiple-Wavelength Anomalous Diffraction (MAD) and monochromatic protein crystallography
|
6–18 keV
|
2002
|
|
8.3.1
|
SB
|
Multiple-Wavelength Anomalous Diffraction (MAD) and Monochromatic Protein Crystallography
|
2.4–15 keV
|
Now
|
|
8.3.2
|
SB
|
Tomography
|
3–60 keV
|
2003
|
|
9.0.1
|
U10
|
Coherent Optics/Scattering Experiments
|
10–800 eV
|
Now
|
|
9.0.2
|
U10
|
Chemical Reaction Dynamics, Photochemistry, High-Resolution Photoelectron and Photoionization Spectroscopy, Photoelectron and Photoionization Imaging and Spectroscopy
|
5–30 eV
|
Now
|
|
9.3.1
|
Bend
|
Atomic, Molecular, and Materials Science
|
2.2–6 keV
|
Now
|
|
9.3.2
|
Bend
|
Chemical and Materials Science, Circular Dichroism, Spin Resolution
|
30–1400 eV
|
Now
|
|
10.0.1
|
U10
|
Photoemission of Highly Correlated Materials; High-Resolution Atomic, Molecular, and Optical Physics
|
17–340 eV
|
Now
|
|
10.3.1
|
Bend
|
X-Ray Fluorescence Microprobe
|
3–20 keV
|
Now
|
|
10.3.2
|
Bend
|
Environmental and Materials Science, Micro X-Ray Absorption Spectroscopy
|
2.5–17 keV
|
Now
|
|
11.0.2
|
EPU5
|
Molecular Environmental Science
|
75–2000 eV
|
2002
|
|
11.3.1
|
Bend
|
Small-Molecule Crystallography
|
6–17 keV
|
2002
|
|
11.3.2
|
Bend
|
Inspection of EUV Lithography Masks
|
50–1000 eV
|
Now
|
|
12.0.1
|
U8
|
EUV Optics Testing and Interferometry, Angle- and Spin-Resolved Photoemission
|
60–320 eV
|
Now
|
|
12.2.2
|
SB
|
California High-Pressure Science Observatory (CALIPSO)
|
6–40 keV
|
2002
|
|
12.3.1
|
SB
|
Multiple-Wavelength Anomalous Diffraction (MAD) Protein Crystallography and Small-Angle X-Ray Scattering (SAXS)
|
6–18 keV
|
2002
|
|
BTF
|
Linac
|
Beam Test Facility
|
50-MeV electrons
|
Now
|
