Beamline 6.3.1
Calibration and Standards, EUV/Soft X-Ray Optics Testing, Solid State Chemistry
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Operational |
1998 |
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Source characteristics |
Bend magnet |
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Energy range |
500 - 2000 eV |
|
Monochromator |
Double crystal |
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Calculated flux (1.9 GeV, 400 mA) |
1011 photons/sec/0.01%BW at 1000 eV |
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Resolving power (E/DE) |
5000 |
|
Endstation |
Reflectometer |
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Characteristics |
VLS-PGM monochromator with fixed exit slit and refocusing mirror; 2-circle goniometer with x, y, z, q sample mirror |
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Spatial resolution |
Can position to 1 µm |
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Detectors |
Si diode, CEM, MCP, total yield |
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Spot size at sample |
5 x 200 µm |
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Samples |
Solid-state, gas phase |
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Format |
Foils, powders, etc. |
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Sample environment |
High vacuum or UHV |
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Scientific applications |
Solid-state chemistry to the Al and Si K edges, atomic physics reflectometry, scattering |
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Local contact/spokesperson |
Name: Jim H. Underwood |