Beamline 6.3.2
Calibration and Standards; EUV Optics Testing;
Atomic, Molecular, and Materials Science
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Operational |
Now |
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Source characteristics |
Bend magnet |
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Energy range |
50 - 1300 eV |
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Monochromator |
VLS-PGM |
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Calculated flux (1.9 GeV, 400 mA) |
1011 photons/sec/0.01%BW at 100 eV |
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Resolving power (E/DE) |
7000 |
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Endstation |
Reflectometer |
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Characteristics |
2-circle goniometer with x, y, z, q movement of sample |
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Spatial resolution |
Can position to 1 µm |
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Detectors |
Si diode, CEM, MCP, total yield |
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Spot size at sample |
5 µm (v) x 300 µm (h) |
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Samples |
Solid state, gas phase |
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Format |
Foils, powders, films |
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Sample environment |
High vacuum or UHV |
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Scientific applications |
Solid-state chemistry, gas phase, atomic physics, reflectometry, scattering |
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Local contact/spokesperson |
Name: Eric Gullikson |