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Beamline 7.3.1.2

Surface and Materials Science, Micro X-Ray Photoelectron Spectroscopy

Operational

Now

Source characteristics

Bend magnet

Energy range

260 - 1500 eV

Monochromator

SGM

Calculated flux (1.9 GeV, 400 mA)

1 x 1010 photons/sec/0.1%BW at 800 eV

Resolving power (E/DE)

1800 at 800 eV

Endstation

Micro-XPS

Characteristics

X-ray photoelectron spectroscopy study of
50 x 50 mm sample with 1-µm2 spot size

Spatial resolution

1 x 1 µm (designed)

Spot size at sample

1.5 x 1.5 µm (now)

Detectors

Electron energy analyzer detector

Samples

Up to 50 x 50 mm

Format

Solid

Preparation

Heating, sputtering

Sample environment

UHV

Special notes

In-vacuum fiducialization of sample using optical visible-light microscope; high-precision 2"  x  4.5" x-y stage; laser interferometer encoding

Experimental techniques

Micro-XPS, NEXAFS, MCD

Scientific applications

Study of microstructures and interfaces in integrated circuits

Local contact

Name: Zahid Hussain
Phone: (510) 486-7591
Fax: (510) 486-7696
Email: hussain@lbl.gov

Spokesperson

Name: Baylor Triplett
Affiliation: Intel Corporation
Phone : (408) 765-2069
Fax: (408) 765-2949
Email: baylor_b_triplett@ccm.sc.intel.com

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