navigation bypass navigation contact us ring status schedules user guide links notices user sites people and policies jobs MicroWorlds publications meetings microscopes specifications About the ALS science highlights ALSNews home
 

 

 

Beamline 11.3.2

Inspection of EUV Lithography Masks

Operational

1998

Source characteristics

Bend magnet

Energy range

50 - 1000 eV

Monochromator

VLS-PGM

Calculated flux (1.9 GeV, 400 mA)

1011 photons/sec/0.01%BW at 100 eV

Resolving power (E/DE)

7000

Endstation system

Scanning bright field and dark field mask inspection

Spot size at sample

4 x 6 µm

Local contact/spokesperson

Name: Jim H. Underwood
Affiliation: Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4958
Fax: (510) 486-4550
Email: jhunderwood@lbl.gov

Table of all beamlines