Operational

Now

Source characteristics

8-cm-period undulator (U8)

Energy range

95 - 130 eV

Monochromator

VLG-PGM

Calculated flux (1.9 GeV, 400 mA)

~6 x 10¹¹ photons/sec/1%BW after 1-µm pinhole

Resolving power (E/DE)

200 - 1000

Endstation

MAXIMUM

Characteristics

Scanning photoelectron microscope with multilayer optics at 95 eV or 130 eV

Spatial resolution

0.1 µm

Detectors

CMA-MCP

Spot size at sample

0.1 µm

Samples

Format

15 x 15 mm maximum sample size

Preparation

Deposition, cleaving, ion beam sputtering, annealing

Sample environment

UHV; in-situ heating and electrical testing

Scientific applications

Semiconductor surfaces and interfaces, microelectronics, metallization, silicides

Local contact

Name: Gian Franco Lorusso
Phone: (510) 486-6853
Fax: (510) 486-4550
Email: glorusso@grace.lbl.gov

Spokesperson

Name: Jim H. Underwood
Affiliation: Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-4958
Fax: (510) 486-4550
Email: jhunderwood@lbl.gov