Operational

Now

Source characteristics

8-cm-period undulator (U8)

Energy range

60 - 320 eV

Monochromator

VLG-PGM

Calculated flux (1.9 GeV, 400 mA)

~5 x 10¹³ photons/sec/1%BW at 134 eV

Resolving power (E/DE)

200 - 1000

Endstation

EUV interferometer

Detectors

GaAsP flux monitor, silicon 1000 x 1000 CCD array

Samples

Format

All-reflective, multilayer-coated EUV optics

Sample environment

10^-7 Torr or 10^-4 Torr of O₂

Scientific applications

Interferometric wavefront measurement of optics designed for EUV lithography

Local contact

Name: Kenneth A. Goldberg
Phone: (510) 486-2261
Fax: (510) 486-4550
Email: kagoldberg@lbl.gov

Spokesperson

Name: Jeffrey Bokor
Affiliation: U.C. Berkeley;
Center for X-Ray Optics, Berkeley Lab
Phone: (510) 642-4134
Fax: (510) 642-2739
Email: jbokor@light.eecs.berkeley.edu