Beamline 6.3.2
Calibration and Standards; EUV Optics Testing;
Atomic, Molecular, and Materials Science
|
Operational |
Now |
|
Source characteristics |
Bend magnet |
|
Energy range |
50 - 1300 eV |
|
Monochromator |
VLS-PGM |
| Calculated flux (1.9 GeV, 400 mA) |
1011 photons/s/0.01%BW at 100 eV |
| Resolving power (E/DE) |
7000 |
|
Endstations |
Reflectometer |
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Characteristics |
2-circle goniometer with x, y, z, q movement of sample |
|
Spatial resolution |
Can position to 1 µm, 0.002° |
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Detectors |
Photodiode, channeltron, and CCD camera on a rotating arm |
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Spot size at sample |
10 (v) x 300 (h) µm |
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Samples |
|
|
Format |
Solid-state, gas phase; foils, powders, films up to 20 cm in diameter |
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Sample environment |
High vacuum or UHV |
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Scientific applications |
Solid-state chemistry, gas phase, atomic physics, reflectometry, scattering |
|
Local contact |
Name: Eric Gullikson |
|
Spokesperson |
Name: Jim H. Underwood |