Beamline 11.0.1
Magnetic microscopy, spectromicroscopy (PEEM 3)
| Operational |
2007 |
| Source characteristics |
5.0-cm-period elliptical polarization undulator (EPU5) |
| Energy range |
100–2000 eV |
| Monochromator |
VLS-PGM |
| Calculated flux (1.9 GeV, 400 mA) | 1013 photons/s/0.1%BW at 800 eV |
| Resolving power (E/ΔE) | 4000 at 800 eV |
| Endstation | Photoemission electron microscope (PEEM3) |
| Characteristics | X-ray absorption spectromicroscopy, psec IR/UV laser for time-resolved studies and alignment |
| Spatial resolution | Better than 50 nm depending on sample, better than 10 nm after aberration correction upgrade (planned for 2008) |
| Detectors | Slow scan CCD |
| Spot size at sample | Adjustable down to 10 x 10 µm |
| Samples | |
| Format | UHV-compatible, flat, conductive samples up to 1 cm2 in area |
| Preparation | Sputter-cleaning, heating, e-beam and sputter evaporation, LEED, transfer capability (2008) |
| Sample environment | UHV, sample heating (800 K) and cooling (60 K) |
| Special notes | Polarization is user selectable; linear polarization continuously variable from horizontal to vertical; left and right elliptical (or circular) polarization |
| Scientific applications | Real-time and pump-probe study of elemental, chemical, magnetic, and topographical properties of materials |
| Local contact | Name: Andreas Scholl Phone: (510) 486-4867 Fax: (510) 486-7696 |
| Spokesperson | Name: Joachim
Stöhr Affiliation: Stanford Synchrotron Radiation Laboratory Phone: (650) 926-2570 Fax: (650) 926-4100 |
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