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Beamline 6.3.2
Calibration and Standards; EUV Optics Testing; Atomic,
Molecular, and Materials Science
Operational |
Now |
Source characteristics |
Bend magnet |
Energy range |
50-1300 eV |
Monochromator |
VLS-PGM |
Calculated flux (1.9 GeV, 400 mA) |
1011 photons/s/0.01%BW at 100 eV |
Resolving power (E/ΔE) |
7000 |
Endstations |
Reflectometer |
Characteristics |
2-circle goniometer with x, y, z, q movement of sample |
Spatial resolution |
Can position to 1 µm, 0.002° |
Detectors |
Photodiode, channeltron, and CCD camera on a rotating
arm |
Spot size at sample |
10 (v) x 300 (h) µm |
Samples |
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Format |
Solid state, gas phase; foils, powders, films up to
20 cm in diameter |
Sample environment |
High vacuum or UHV |
Scientific applications |
Solid-state chemistry, gas phase, atomic physics, reflectometry,
scattering |
Local contact |
Name: Andy Aquila
Phone: (510) 495-2063
Fax: (510) 486-4955
Email: alaquila@lbl.gov |
Spokesperson |
Name: Eric Gullikson
Affiliation: Center for X-Ray Optics, Berkeley Lab
Phone: (510) 486-6646
Fax: (510) 486-4550
Email: emgullikson@lbl.gov |
Beamline phone number |
(510) 495-2063 |
A data sheet about this
beamline is available in Portable Document Format (PDF)
More information about this beamline is available at the CXRO
Beamline 6.3.2 Web site.
Table of all beamlines
Diagram of all beamlines
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